US D1,028,913 S
Semiconductor deposition reactor ring
Rutvij Naik, Tempe, AZ (US); Junwei Su, Tempe, AZ (US); Wentao Wang, Chandler, AZ (US); Chuqin Zhou, Tempe, AZ (US); and Xing Lin, Chandler, AZ (US)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP HOLDING B.V., Almere (NL)
Filed on Jun. 30, 2021, as Appl. No. 29/797,476.
Term of patent 15 Years
LOC (14) Cl. 13 - 03
U.S. Cl. D13—182
OG exemplary drawing
 
The ornamental design for a semiconductor deposition reactor ring, as shown and described.