US 11,996,376 B2
Semiconductor storage device
Junichi Shibata, Yokkaichi Mie (JP)
Assigned to Kioxia Corporation, Tokyo (JP)
Filed by KIOXIA CORPORATION, Tokyo (JP)
Filed on Mar. 1, 2021, as Appl. No. 17/189,234.
Claims priority of application No. 2020-139279 (JP), filed on Aug. 20, 2020.
Prior Publication US 2022/0059481 A1, Feb. 24, 2022
Int. Cl. H01L 21/768 (2006.01); H01L 21/762 (2006.01); H01L 23/00 (2006.01); H01L 25/065 (2023.01); H01L 25/18 (2023.01)
CPC H01L 24/08 (2013.01) [H01L 25/0657 (2013.01); H01L 25/18 (2013.01); H01L 2224/08145 (2013.01); H01L 2924/1431 (2013.01); H01L 2924/14511 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A semiconductor storage device, comprising:
a first chip including a semiconductor substrate, a plurality of transistors, a first interconnect, and a plurality of first bonding electrodes, the first interconnect being at a position between a pair of transistors in the plurality transistors in a first direction parallel to the semiconductor substrate;
a second chip including a memory cell array and a plurality of second bonding electrodes, the second bonding electrodes being bonded to the first bonding electrodes; and
a plurality of bonding pad electrodes on the first chip or the second chip, the bonding pad electrodes being connectable to bonding wires, wherein
the plurality of second bonding electrodes includes:
third bonding electrodes that overlap the memory cell array and are in a current pathway between the memory cell array and the transistors; and
fourth bonding electrodes that overlap the memory cell array but are not in a current pathway between the memory cell array and the transistors,
the first interconnect is electrically connected to a bonding pad electrode in the plurality of bonding pad electrodes,
the first interconnect is not electrically connected to any of the transistors, and
the first interconnect is electrically connected to a fourth bonding electrode in the plurality of fourth bonding electrodes.