US 11,996,305 B2
Selective oxidation on rapid thermal processing (RTP) chamber with active steam generation
Chaitanya Anjaneyalu Prasad, Cupertino, CA (US); Christopher Sean Olsen, Fremont, CA (US); Lara Hawrylchak, Gilroy, CA (US); Erika Gabrielle Hansen, San Jose, CA (US); Daniel C. Glover, Danville, CA (US); Naman Apurva, Patna (IN); and Tsung-Han Yang, Santa Clara, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jun. 29, 2021, as Appl. No. 17/362,760.
Prior Publication US 2022/0415676 A1, Dec. 29, 2022
Int. Cl. H01L 21/67 (2006.01); H01L 21/02 (2006.01)
CPC H01L 21/67115 (2013.01) [H01L 21/02238 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A gas distribution module for use with a rapid thermal processing (RTP) chamber, comprising:
a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture, wherein the mixer includes a mixing block coupled to the one or more control valves and having a mixing line disposed therebetween, wherein the mixing block includes a first inlet for the first liquid line that extends into the mixing line, a second inlet for the first carrier gas line that extends into the mixing line, and an outlet for the first mixture that extends from the mixing line;
a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and
a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.