US 11,996,275 B2
Device for radical diagnostic in plasma processing chamber, radical diagnostic system having the same, and operating method thereof
Sungyong Lim, Seoul (KR); Chansoo Kang, Hwaseong-si (KR); Youngdo Kim, Hwaseong-si (KR); Namkyun Kim, Pyeongtaek-si (KR); Sungyeol Kim, Yongin-si (KR); Sangki Nam, Seongnam-si (KR); Seungbo Shim, Seoul (KR); and Kyungmin Lee, Gwacheon-si (KR)
Assigned to Samsung Electronics Co., Ltd., (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Sep. 12, 2022, as Appl. No. 17/942,368.
Claims priority of application No. 10-2021-0181314 (KR), filed on Dec. 17, 2021.
Prior Publication US 2023/0197423 A1, Jun. 22, 2023
Int. Cl. H01J 37/32 (2006.01); G01J 1/44 (2006.01)
CPC H01J 37/32935 (2013.01) [G01J 1/44 (2013.01); H01J 37/32174 (2013.01); G01J 2001/446 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A diagnostic device for diagnosing distribution of radicals in a plasma processing chamber, the diagnostic device comprising:
a spectrometer configured to receive an optical signal through at least one optical channel connected to the plasma processing chamber, and to perform spectral analysis on the optical signal in response to a synchronization signal corresponding to each state of a plurality of states of a multi-level pulse applied to the plasma processing chamber;
an internal sensor configured to detect an envelope of the optical signal; and
a synchronizer configured to generate the synchronization signal corresponding to each state of the plurality of states of the multi-level pulse,
wherein during each state a different process is conducted in the plasma processing chamber,
wherein the synchronizer is configured to generate the synchronization signal according to the detection of the envelope of the internal sensor, and
wherein the internal sensor includes a fast time photo meter.