US 11,996,272 B2
Method and device for plasma-chemical gas/gas mixture conversion
Boris Vladlenovich Mislavskij, Moscow (RU); Roman Lazirovich Iliev, Moscow (RU); Mikhail Yuryevich Marin, Moscow (RU); and Evgeny Pavlovich Gorelik, Himki (RU)
Assigned to Boris Mislavskij, Moscow (RU)
Appl. No. 17/284,153
Filed by Boris Vladlenovich Mislavskij, Moscow (RU)
PCT Filed Oct. 10, 2019, PCT No. PCT/RU2019/000696
§ 371(c)(1), (2) Date Apr. 9, 2021,
PCT Pub. No. WO2020/076186, PCT Pub. Date Apr. 16, 2020.
Claims priority of application No. 2018136120 (RU), filed on Oct. 12, 2018.
Prior Publication US 2021/0335580 A1, Oct. 28, 2021
Int. Cl. H01J 37/32 (2006.01); B01J 19/08 (2006.01); H05H 1/24 (2006.01); H05H 1/48 (2006.01)
CPC H01J 37/32449 (2013.01) [B01J 19/088 (2013.01); H01J 37/32541 (2013.01); H05H 1/48 (2013.01); B01J 2219/0809 (2013.01); B01J 2219/083 (2013.01); B01J 2219/0871 (2013.01); B01J 2219/0883 (2013.01); H05H 1/4697 (2021.05)] 10 Claims
OG exemplary drawing
 
1. A method of plasma-chemical conversion of a gas comprising:
generating a flow of said gas through a reaction chamber of a reactor comprising a discharge chamber, electrodes, and input and output modules;
generating a pulsed electrical discharge in the reaction chamber that produces hot plasma channels that connects the electrodes;
wherein a ratio between an average flow velocity of the gas in the reaction chamber to the average discharge current falls within the following range:
250 J/(m3*A2)ρ<*V2/I2<4,000 J/(m3*A2),
where ρ is the density of the gas in the reaction chamber (kg/m3), V is the average flow velocity of the gas in the reaction chamber (m/s), and I is the average current of the pulsed electrical discharge (A); wherein a frequency of said pulsed electrical discharge is between 20 and 300 kHz.