CPC G03F 7/0042 (2013.01) [G03F 7/0045 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/325 (2013.01)] | 9 Claims |
1. A resist material comprising:
(i) a metal compound shown by the following general formula (M-1) and (ii) an organic solvent,
![]() wherein M1 represents an element selected from titanium, zirconium, hafnium, and tin; R1 and R2 each independently represents a linear or branched alkyl group or alkoxy group having 1 to 6 carbon atoms or an aryl group having 6 to 20 carbon atoms, and one or more hydrogen atoms are optionally substituted with a halogen atom; R3 represents a halogen atom or a linear or branched alkyl group or alkoxy group having 1 to 6 carbon atoms; and “f” represents 1 to 4 and “g” represents 0 to 3, where f+g=4,
further comprising:
(iii) a reaction product of a (partial) condensate or a (partial) hydrolysis-condensate of a metal compound shown by the following general formula (A-1) and a dihydric or trihydric alcohol shown by the following general formula (A-2),
M2(OR1A)4 (A-1)
wherein M2 represents an element selected from titanium, zirconium, and hafnium; and R1A represents a linear or branched alkyl group having 1 to 12 carbon atoms; and
R2A(OH)m (A-2)
wherein “m” represents 2 or 3; when “m” represents 2, R2A represents a divalent group selected from a substituted or unsubstituted, linear, branched, or cyclic alkylene group, alkenylene group, alkynylene group, or aralkylene group having 2 to 20 carbon atoms optionally including an ester bond or ether bond; when “m” represents 3, R2A represents a trivalent group, which is the divalent group having one hydrogen atom removed,
wherein the proportion of the component (i) to the total amount of the component (i) and the component (iii) is 5 to 80 mass %,
further comprising (iv) a photo-acid generator, wherein the component (iv) is a compound that generates a carboxylic acid shown by the following general formula (B-3) or (B-4),
![]() wherein R9 represents a linear, branched, or cyclic alkyl group, alkenyl group, or oxoalkyl group having 5 to 20 carbon atoms optionally including an ester bond or ether bond, or an aryl group, aralkyl group, or aryloxoalkyl group having 6 to 20 carbon atoms, and one or more hydrogen atoms are optionally substituted with a halogen atom, hydroxy group, carboxy group, or amino group; furthermore, R9 optionally represents a hydroxy group; Rf1 and Rf2 each independently represents a fluorine atom or trifluoromethyl group; and
![]() wherein R10 to R12 each independently represents a halogen atom, hydroxy group, carboxy group, substituted or unsubstituted, linear, branched, or cyclic alkyl group, alkenyl group, alkoxy group, alkoxycarbonyl group, or alkylcarbonyloxy group having 1 to 10 carbon atoms; and j, k, and p each independently represents 0 to 5, where j+k+p≤5, and
further comprising (v) a basic compound, wherein the component (v) is a nitrogen-containing compound,
wherein the blended amount of the component (iv) is 0.5 to 30 parts by mass relative to 100 parts by mass of the total amount of the component (i) and the component (iii), and
wherein the resist material is a negative type resist material.
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