US 11,993,946 B2
Davit arm base
Adam John Miller, Cranbourne (AU); Robert Leslie Miller, Cranbourne (AU); and Andrew Glover, Cranbourne (AU)
Assigned to Adam Miller, Cranbourne (AU); and Robert Miller, Cranbourne (AU)
Appl. No. 17/604,099
Filed by Adam John Miller, Cranbourne (AU); and Robert Leslie Miller, Cranbourne (AU)
PCT Filed Apr. 16, 2020, PCT No. PCT/AU2020/000033
§ 371(c)(1), (2) Date Oct. 15, 2021,
PCT Pub. No. WO2020/210858, PCT Pub. Date Oct. 22, 2020.
Claims priority of application No. 2019901320 (AU), filed on Apr. 16, 2019.
Prior Publication US 2022/0220741 A1, Jul. 14, 2022
Int. Cl. E04H 12/22 (2006.01); B66C 23/16 (2006.01); E04C 3/02 (2006.01); E04C 3/30 (2006.01); F16M 11/22 (2006.01)
CPC E04H 12/2269 (2013.01) [B66C 23/166 (2013.01); E04C 3/02 (2013.01); E04C 3/30 (2013.01); E04H 12/22 (2013.01); E04H 12/2253 (2013.01); E04H 12/2261 (2013.01); F16M 11/22 (2013.01); E04H 12/2215 (2013.01); F16M 2200/066 (2013.01); F16M 2200/08 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A davit arm holder for a davit arm for suspending lines from elevated heights by mounting the davit arm on a structural substrate, said davit arm holder comprising a base formed from one or more planar layers of sheet material adapted to lie parallel to a plane of a surface of the substrate, and an attachment adapted to be fixedly attached to the base and to provide a connection to engage a davit arm,
wherein:
A. the base comprises:
a. an outer layer having a plurality of first engagement portions that are radially spaced from a central region of the base; and
b. at least one mount integrally formed with the outer layer, fixedly securable to the substrate and adapted to space an inside surface of the outer layer from the substrate to form a gap under the outer layer, whereby the base is adapted to have a low-profile limited to the thickness of the outer layer and the size of the gap when anchored to the substrate; and
B. the attachment is adapted to be releasably engaged to the base by a plurality of second engagement portions adapted to engage the corresponding plurality of first engagement portions by rotation of the attachment about an axis perpendicular to the plane.