| CPC H01L 23/18 (2013.01) [H01L 21/56 (2013.01); H01L 21/565 (2013.01); H01L 21/568 (2013.01); H01L 23/3107 (2013.01); H01L 23/373 (2013.01); H01L 24/13 (2013.01); H01L 24/19 (2013.01); H01L 24/95 (2013.01); H01L 24/96 (2013.01); H01L 21/7806 (2013.01); H01L 2224/05001 (2013.01); H01L 2224/05008 (2013.01); H01L 2224/05024 (2013.01); H01L 2224/05026 (2013.01); H01L 2224/05124 (2013.01); H01L 2224/05144 (2013.01); H01L 2224/05147 (2013.01); H01L 2224/05568 (2013.01); H01L 2224/05624 (2013.01); H01L 2224/05644 (2013.01); H01L 2224/12105 (2013.01); H01L 2924/01029 (2013.01); H01L 2924/10253 (2013.01); H01L 2924/14 (2013.01); H01L 2924/181 (2013.01); H01L 2924/18162 (2013.01); H01L 2924/19041 (2013.01); H01L 2924/3512 (2013.01)] | 19 Claims |

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1. A semiconductor device, comprising:
a die having an active surface;
a bond pad at the active surface, wherein the bond pad has an upper surface, and wherein the upper surface is coplanar with the active surface of the die;
a first layer of insulating material carried by the active surface, the first layer of insulating material including a first opening aligned with the bond pad along a vertical axis perpendicular to the active surface of the die;
a molded body surrounding a lateral perimeter of the die, wherein the molded body includes an extension portion over a portion of the active surface of the die and in contact with a sidewall of the first layer of insulating material;
a second layer of insulating material carried by the first layer of insulating material and the molded body, the second layer of insulating material including a second opening aligned with the first opening along the vertical axis; and
a conductive layer carried by the second layer of insulation material, the conductive layer electrically coupled to the bond pad through the first and second openings.
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