| CPC H01L 21/67386 (2013.01) [H01L 21/67017 (2013.01); H01L 21/67389 (2013.01)] | 19 Claims |

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1. A method comprising installing a purge fluid conditioning element having a base portion and a conditioning portion into an interior space of a semiconductor substrate carrying container that includes a plurality of walls that define the interior space and that has an opening that is sized to permit a semiconductor substrate to be inserted into and removed from the interior space, wherein installing the purge fluid conditioning element comprises installing the purge fluid conditioning element from outside the semiconductor substrate carrying container and through a port formed in one of the walls.
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