US 12,312,680 B2
Plasma enhanced chemical vapor deposition of graphene on optical fibers
Deepan Kishore Kumar, San Jose, CA (US); and Nai-Chang Yeh, Pasadena, CA (US)
Assigned to California Institute of Technology, Pasadena, CA (US)
Filed by California Institute of Technology, Pasadena, CA (US)
Filed on Dec. 22, 2022, as Appl. No. 18/086,996.
Claims priority of provisional application 63/295,086, filed on Dec. 30, 2021.
Prior Publication US 2023/0212743 A1, Jul. 6, 2023
Int. Cl. C23C 16/26 (2006.01); C23C 16/511 (2006.01); H01J 37/32 (2006.01)
CPC C23C 16/26 (2013.01) [C23C 16/511 (2013.01); H01J 37/32449 (2013.01); H01J 37/32743 (2013.01); H01J 37/32816 (2013.01); H01J 2237/3321 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of growing one or more graphene sheets on one or more regions of an optical fiber using plasma-enhanced chemical vapor deposition (PECVD), the method comprising:
placing the optical fiber in a growth chamber;
providing a shielding structure surrounding the optical fiber;
placing one or more carbon-containing precursors in the growth chamber;
forming a reduced pressure in the growth chamber;
flowing methane gas and hydrogen gas into the growth chamber;
generating a plasma in the growth chamber;
forming a gaseous carbon-containing precursor from the one or more carbon-containing precursors;
exposing the one or more regions of the optical fiber to the methane gas, the hydrogen gas, the gaseous carbon-containing precursor, and the plasma; and
concurrently providing the shielding structure surrounding the optical fiber and forming the one or more graphene sheets on the one or more regions of the optical fiber.