US 12,312,679 B2
Method for producing N-doped carbon nanomesh
Miran Mozetic, Ljubljana (SI); Alenka Vesel, Ljubljana (SI); Gregor Primc, Ljubljana (SI); and Rok Zaplotnik, Ljubljana (SI)
Assigned to Joz̃Stefan Institute, Ljubljana (SI)
Filed by Joz̃ef Stefan Institute, Ljubljana (SI)
Filed on Dec. 22, 2020, as Appl. No. 17/130,417.
Prior Publication US 2022/0195593 A1, Jun. 23, 2022
Int. Cl. C23C 16/50 (2006.01); C23C 16/26 (2006.01); C23C 16/448 (2006.01); C23C 16/46 (2006.01); C23C 16/505 (2006.01); C23C 16/511 (2006.01); C23C 16/54 (2006.01); H01G 11/84 (2013.01)
CPC C23C 16/26 (2013.01) [C23C 16/4488 (2013.01); C23C 16/46 (2013.01); C23C 16/505 (2013.01); C23C 16/511 (2013.01); C23C 16/545 (2013.01); H01G 11/84 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method for deposition of nitrogen-doped nanocarbon comprising:
disposing molten polymer and a heated substrate in a plasma reactor, wherein the molten polymer is at a temperature of between 20° and 600° C. and the heated substrate is at a temperature of between 30° and 1200° C.;
providing dense nitrogen-containing plasma in the plasma reactor in a space between the molten polymer and the heated substrate, wherein providing the dense nitrogen plasma comprises applying a power used of between 1 and 30 MW/m3, and wherein the nitrogen pressure in the plasma reactor is between 1 and 50 Pa; and
allowing the dense nitrogen-containing plasma to interact with both the molten polymer and the heated substrate to form a film of nitrogen-containing nanocarbon on the heated substrate;
wherein the molten polymer comprises polyethylene terephthalate.