US 12,312,569 B2
Kit for cleaning agent and method for preparing cleaning agent
Satoshi Shirahata, Kawagoe (JP); Takahiro Yokomizo, Kawagoe (JP); Yoshihisa Tsurumi, Kawagoe (JP); Tsutomu Watahiki, Kawagoe (JP); Takayuki Kajikawa, Kawagoe (JP); Kohei Hayashi, Kawagoe (JP); and Hironori Mizuta, Kawagoe (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Jun. 25, 2021, as Appl. No. 17/358,717.
Application 17/358,717 is a continuation of application No. PCT/JP2019/046804, filed on Nov. 29, 2019.
Claims priority of application No. 2018-248458 (JP), filed on Dec. 28, 2018.
Prior Publication US 2021/0317391 A1, Oct. 14, 2021
Int. Cl. C11D 3/28 (2006.01); C11D 3/30 (2006.01); C11D 3/32 (2006.01); C11D 3/33 (2006.01); C11D 7/32 (2006.01); C11D 17/08 (2006.01); H01L 21/304 (2006.01)
CPC C11D 7/3209 (2013.01) [C11D 7/3281 (2013.01); C11D 17/08 (2013.01); C11D 2111/22 (2024.01); H01L 21/304 (2013.01)] 13 Claims
 
1. A kit for preparing a cleaning agent with a pH of 7.5 to 13.0 that is used in cleaning of a semiconductor substrate having undergone a chemical mechanical polishing process, the kit comprising:
a first liquid containing a compound represented by Formula (1), an acidic compound and water and showing acidic properties; and
a second liquid containing a basic compound and showing alkaline properties,
wherein the basic compound comprises a hydroxylamine compound, and
the basic compound further comprises at least one selected from the group consisting of a diamine compound, an amidine compound, an azole compound, a pyrazine compound, a pyrimidine compound, and a quaternary ammonium compound,

OG Complex Work Unit Chemistry
where R1 to R5 each independently represent a hydrogen atom, a hydroxyl group, a carboxyl group, or an alkoxycarbonyl group, and at least two of R1 to R5 represent a hydroxyl group, provided that a combination in which R1 and R5 each represent a hydroxyl group, a combination in which R2 and R4 each represent a hydroxyl group, and a combination in which R3 and R5 each represent a hydroxyl group are excluded.