CPC H01L 29/7805 (2013.01) [H01L 29/1608 (2013.01)] | 31 Claims |
1. A semiconductor device comprising:
a substrate;
a drift layer on the substrate, the drift layer having a minority carrier lifetime between 1 μs and 20 μs; and
one or more implanted regions in the drift layer, the one or more implanted regions configured to:
provide a vertical transistor device configured to conduct current in a first direction; and
provide a body diode configured to conduct current in a second direction opposite the first direction,
wherein the drift layer has a first doping type and a first doping concentration;
wherein the one or more implanted regions comprise a body well having a second doping type opposite the first doping type and a second doping concentration; and
wherein the first and second doping concentrations and a thickness of the drift layer are configured so that a softness factor of the body diode is between 0.5 and 10.
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