US 11,990,470 B2
Ferroelectric and paraelectric stack capacitors
Takashi Ando, Eastchester, NY (US); Reinaldo Vega, Mahopac, NY (US); Cheng Chi, Jersey City, NJ (US); and Praneet Adusumilli, Somerset, NJ (US)
Assigned to International Business Machines Corporation, Armonk, NY (US)
Filed by International Business Machines Corporation, Armonk, NY (US)
Filed on Sep. 24, 2021, as Appl. No. 17/483,958.
Prior Publication US 2023/0103003 A1, Mar. 30, 2023
Int. Cl. H01L 27/08 (2006.01); H01L 49/02 (2006.01)
CPC H01L 27/0805 (2013.01) [H01L 28/60 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An apparatus comprising:
a first plate;
a second plate;
a third plate;
a fourth plate;
a ferroelectric dielectric positioned between the first plate and the second plate such that the first plate, the ferroelectric dielectric, and the second plate form a first capacitor;
a first paraelectric dielectric physically separated from the ferroelectric dielectric and positioned between the second plate and the third plate; and
a second paraelectric dielectric physically separated from the first paraelectric dielectric and positioned between the third plate and the fourth plate such that the second plate, the first paraelectric dielectric, the third plate, the second paraelectric dielectric, and the fourth plate form a second capacitor, and such that the first capacitor and the second capacitor share the second plate.