US 11,990,361 B2
Electrostatic chuck, etching apparatus, and method of manufacturing display device
Hee Sun Jang, Incheon (KR); Tae Hun Kim, Suwon-si (KR); Do Hwan Kim, Seoul (KR); Jae Han Kim, Seoul (KR); Seung Ho Myoung, Hwaseong-si (KR); Dae Young Oh, Hwaseong-si (KR); and Gyeong Hee Han, Yongin-si (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Yongin-si (KR)
Filed by Samsung Display Co., LTD., Yongin-si (KR)
Filed on Jul. 1, 2021, as Appl. No. 17/365,990.
Claims priority of application No. 10-2020-0095875 (KR), filed on Jul. 31, 2020.
Prior Publication US 2022/0037186 A1, Feb. 3, 2022
Int. Cl. H01L 21/683 (2006.01); H10K 71/00 (2023.01); H10K 50/11 (2023.01); H10K 50/844 (2023.01); H10K 59/12 (2023.01)
CPC H01L 21/6833 (2013.01) [H10K 71/00 (2023.02); H10K 50/11 (2023.02); H10K 50/844 (2023.02); H10K 59/12 (2023.02); H10K 59/1201 (2023.02)] 16 Claims
OG exemplary drawing
 
1. A chuck for supporting a target substrate for a display device, the chuck comprising:
a base having a first surface to support an object solely by electrostatic force and a second surface opposite the first surface, the first surface including a first area and a second area; and
indentations formed in the second area and recessed from the first area in a thickness direction of the base, wherein the indentations include a first indentation extending in a first direction and a second indentation extending in a second direction intersecting the first direction, the indentations being configured to decrease an energy of a laser beam directed to the second area of the first surface of the chuck.