US 11,990,360 B2
Electrostatic chuck (ESC) pedestal voltage isolation
Miguel Benjamin Vasquez, Portland, OR (US); and Vincent Burkhart, Cupertino, CA (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Appl. No. 16/966,833
Filed by Lam Research Corporation, Fremont, CA (US)
PCT Filed Jan. 30, 2019, PCT No. PCT/US2019/015865
§ 371(c)(1), (2) Date Jul. 31, 2020,
PCT Pub. No. WO2019/152528, PCT Pub. Date Aug. 8, 2019.
Claims priority of provisional application 62/624,619, filed on Jan. 31, 2018.
Prior Publication US 2021/0043490 A1, Feb. 11, 2021
Int. Cl. H01L 21/683 (2006.01); H01J 37/32 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/6833 (2013.01) [H01J 37/32082 (2013.01); H01J 37/32715 (2013.01); H01L 21/68757 (2013.01); H01L 21/68792 (2013.01); H01J 37/32577 (2013.01)] 21 Claims
OG exemplary drawing
 
1. A tube adapter portion for use in an electrostatic chuck (ESC) assembly of a plasma-based processing system, the tube adapter portion comprising aluminum metal comprising:
a dielectric coating formed on an inner surface of the tube adapter portion configured to prevent arcing between high voltage electrodes within the tube adapter portion and a main body of the tube adapter portion during an operation of the plasma-based processing system, the dielectric coating having a coefficient-of-thermal-expansion (CTE) that is substantially similar to a material from which the tube adapter portion is formed,
a plurality of insulative tubes within the tube adapter portion, each of the plurality of insulative tubes configured to receive one of multiple radio-frequency (RF) signal electrodes to be enclosed therein, each of the plurality of insulative tubes being configured to prevent arcing between a respective one of the radio-frequency (RF) signal electrodes enclosed therein and a main body of the tube adapter portion during operation of the plasma-based processing system, and
an enlarged gap portion of the tube adapter portion above the plurality of insulative tubes, a dimension of the enlarged gap portion being configured to prevent arcing between a high voltage signal carried by respective ones of the radio-frequency signal electrodes and a main body of the tube adapter portion during operation of the plasma-based processing system.