CPC H01L 21/6833 (2013.01) [H01J 37/32082 (2013.01); H01J 37/32715 (2013.01); H01L 21/68757 (2013.01); H01L 21/68792 (2013.01); H01J 37/32577 (2013.01)] | 21 Claims |
1. A tube adapter portion for use in an electrostatic chuck (ESC) assembly of a plasma-based processing system, the tube adapter portion comprising aluminum metal comprising:
a dielectric coating formed on an inner surface of the tube adapter portion configured to prevent arcing between high voltage electrodes within the tube adapter portion and a main body of the tube adapter portion during an operation of the plasma-based processing system, the dielectric coating having a coefficient-of-thermal-expansion (CTE) that is substantially similar to a material from which the tube adapter portion is formed,
a plurality of insulative tubes within the tube adapter portion, each of the plurality of insulative tubes configured to receive one of multiple radio-frequency (RF) signal electrodes to be enclosed therein, each of the plurality of insulative tubes being configured to prevent arcing between a respective one of the radio-frequency (RF) signal electrodes enclosed therein and a main body of the tube adapter portion during operation of the plasma-based processing system, and
an enlarged gap portion of the tube adapter portion above the plurality of insulative tubes, a dimension of the enlarged gap portion being configured to prevent arcing between a high voltage signal carried by respective ones of the radio-frequency signal electrodes and a main body of the tube adapter portion during operation of the plasma-based processing system.
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