US 11,990,321 B2
Fast response pedestal assembly for selective preclean
Lara Hawrylchak, Gilroy, CA (US); and Chaitanya A. Prasad, Cupertino, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 23, 2022, as Appl. No. 17/992,995.
Application 17/992,995 is a continuation of application No. 15/934,415, filed on Mar. 23, 2018, granted, now 11,515,130.
Claims priority of provisional application 62/638,716, filed on Mar. 5, 2018.
Prior Publication US 2023/0086640 A1, Mar. 23, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01); B08B 7/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01)
CPC H01J 37/32724 (2013.01) [B08B 7/00 (2013.01); H01J 37/3244 (2013.01); H01L 21/02046 (2013.01); H01L 21/67028 (2013.01); H01L 21/67069 (2013.01); H01L 21/67103 (2013.01); H01L 21/67109 (2013.01); H01L 21/68757 (2013.01); H01L 21/68792 (2013.01); H01J 2237/002 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01)] 20 Claims
OG exemplary drawing
 
10. A processing chamber suitable for use in semiconductor manufacturing, comprising:
a chamber body; and
a pedestal assembly at least partially disposed within a processing region of the chamber body, wherein the pedestal assembly includes a substrate support pedestal to support a substrate thereon during processing, the substrate support pedestal comprising:
a shaft; and
an aluminum substrate support plate having a top surface and a bottom surface, an inner periphery, and an outer periphery circumscribing the inner periphery, the aluminum substrate support plate mechanically coupled to the shaft and comprising:
vertical passages extending from the bottom surface to the top surface of the aluminum substrate support plate, and wherein the top surface is coated with a ceramic material, the vertical passages comprising vacuum passages; and
a gas distribution plate in contact with the bottom surface of the aluminum substrate support plate, the gas distribution plate comprising a plurality of gas passages aligned with the vacuum passages;
a lip extending outward below the top surface, the lip extending between the outer periphery and the inner periphery, wherein the ceramic material extends to the inner periphery and solely coats the top surface, such that the lip is exposed and sides of the aluminum substrate support plate are exposed and uncoated by the ceramic material;
a plurality of concentric gas distribution channels configured to receive gas through the vertical passages from the gas distribution plate; and
a plurality of radial distribution channels coupled to the plurality of concentric gas distribution channels, wherein the ceramic material is disposed over the plurality of concentric gas distribution channels and the plurality of radial distribution channels.