US 11,990,320 B2
Apparatus for preventing contamination of self-plasma chamber
Dong Ho Cha, Gyeonggi-do (KR)
Assigned to NANOTECH INC., (KR)
Appl. No. 16/646,408
Filed by NANOTECH INC., Gyeonggi-do (KR)
PCT Filed Aug. 7, 2018, PCT No. PCT/KR2018/008999
§ 371(c)(1), (2) Date Mar. 11, 2020,
PCT Pub. No. WO2019/054635, PCT Pub. Date Mar. 21, 2019.
Claims priority of application No. 10-2017-0117900 (KR), filed on Sep. 14, 2017.
Prior Publication US 2020/0273676 A1, Aug. 27, 2020
Int. Cl. H01J 37/32 (2006.01); C23C 16/50 (2006.01)
CPC H01J 37/32504 (2013.01) [C23C 16/50 (2013.01); H01J 37/32183 (2013.01); H01J 37/32568 (2013.01); H01J 37/32651 (2013.01); H01J 37/32834 (2013.01); H01J 2237/022 (2013.01); H01J 2237/026 (2013.01); H01J 2237/332 (2013.01)] 4 Claims
OG exemplary drawing
 
1. An apparatus comprising a self-plasma chamber comprising a shielding means, wherein the self-plasma chamber is connected to a branch pipe branching from an exhaust pipe of a process chamber to analyze components of gas generated from the process chamber,
wherein the shielding means prevents ground-electrode material, generated due to a sputtering phenomenon when a positive charge of the plasma generated from the self-plasma chamber collides with a ground electrode connector, from being introduced into a discharge chamber, wherein the self-plasma chamber comprises:
the ground electrode connector connected to the branch pipe, a flange formed on one end of the ground electrode connector which is connected to the branch pipe, and the discharge chamber connected to an other end of the ground electrode connector is made of non-metallic material, wherein the one end of the ground electrode connector is opposite to the other end of the ground electrode connector, wherein the discharge chamber comprises: a discharge area connected to the other end of the ground electrode connector; a main discharge chamber extending from the discharge area, having an outer diameter smaller than an outer diameter of the discharge area, with a stepped portion being formed on an end of the discharge area connected to the main discharge chamber, and wherein the stepped portion is configured to function as the shielding means.