US 11,990,317 B2
High-frequency power supply system
Yuichi Hasegawa, Osaka (JP)
Assigned to DAIHEN CORPORATION, Osaka-Fu (JP)
Filed by DAIHEN CORPORATION, Osaka (JP)
Filed on Dec. 21, 2022, as Appl. No. 18/086,406.
Claims priority of application No. 2021-214221 (JP), filed on Dec. 28, 2021.
Prior Publication US 2023/0207264 A1, Jun. 29, 2023
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32165 (2013.01) [H01J 37/32183 (2013.01); H01J 2237/327 (2013.01)] 3 Claims
OG exemplary drawing
 
1. A high-frequency power supply system for providing a high-frequency power to a connected load, the system comprising:
a first power supply configured to output a first high-frequency voltage having a first fundamental frequency so as to supply a first high-frequency power to the load;
a second power supply configured to output a second high-frequency voltage having a second fundamental frequency that is lower than the first fundamental frequency so as to supply a second high-frequency power to the load; and
a matching device including a first matching part connected between the first power supply and the load and a second matching part connected between the second power supply and the load,
wherein:
the matching device provides a system clock to each of the first power supply and the second power supply,
the second power supply outputs a second high-frequency voltage at a control period determined based on the system clock provided from the matching device, and
the first power supply outputs a first high-frequency voltage obtained by frequency modulation of a fundamental wave signal having a first fundamental frequency and through amplification, in each control period determined based on the system clock provided from the matching device.