US 11,990,315 B2
Measurement and correction of optical aberrations in charged particle beam microscopy
Erik Franken, Nuenen (NL); and Bart Jozef Janssen, Eindhoven (NL)
Assigned to FEI Company, Hillsboro, OR (US)
Filed by FEI Company, Hillsboro, OR (US)
Filed on Feb. 28, 2022, as Appl. No. 17/683,076.
Prior Publication US 2023/0274908 A1, Aug. 31, 2023
Int. Cl. H01J 37/28 (2006.01); H01J 37/153 (2006.01)
CPC H01J 37/28 (2013.01) [H01J 37/153 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/20207 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2817 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
with a charged particle beam microscope system operating in a transmission imaging mode, directing a charged particle beam to a sample including applying a time series of beam tilts in a pattern to the charged particle beam to produce a sequence of images, wherein at least some of the images in the sequence of images are captured while the charged particle beam is transitioning between one beam tilt in the time series of beam tilts and a sequentially adjacent beam tilt in the time series of beam tilts, and wherein the pattern is configured to induce image changes between the images in the sequence of images that are indicative of optical aberrations in the charged particle beam microscope system; and
capturing the sequence of images.