US 11,990,314 B2
Sample preparation system and method for electron microscope observation, and tape feeding mechanism used for sample preparation
Shinsuke Shibata, Tokyo (JP); Tomoko Shindo, Tokyo (JP); Hideyuki Okano, Tokyo (JP); and Shuichi Goto, Tokyo (JP)
Assigned to SANYU ELECTRON CO., LTD., Tokyo (JP); and KEIO UNIVERSITY, Tokyo (JP)
Appl. No. 17/417,451
Filed by SANYU ELECTRON CO., LTD., Tokyo (JP); and KEIO UNIVERSITY, Tokyo (JP)
PCT Filed Dec. 26, 2019, PCT No. PCT/JP2019/051141
§ 371(c)(1), (2) Date Jun. 23, 2021,
PCT Pub. No. WO2020/138297, PCT Pub. Date Jul. 2, 2020.
Claims priority of application No. 2018-248067 (JP), filed on Dec. 28, 2018.
Prior Publication US 2022/0068598 A1, Mar. 3, 2022
Int. Cl. H01J 37/28 (2006.01); G01N 1/28 (2006.01); H01J 37/32 (2006.01)
CPC H01J 37/28 (2013.01) [G01N 1/28 (2013.01); H01J 37/32532 (2013.01); H01J 2237/2602 (2013.01); H01J 2237/2813 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A sample preparation system for electron microscope observation comprising:
at least one of a plasma treatment apparatus and a sputtering apparatus, the plasma treatment apparatus being configured to feed a resin tape in a plasma irradiation area to irradiate the resin tape with plasma, thereby continuously hydrophilizing the resin tape, and the sputtering apparatus being configured to feed the resin tape in a sputtering area to continuously perform sputtering on the resin tape, thereby imparting conductivity to the resin tape, and
a collecting apparatus configured to serially collect slices cut out from a sample onto the resin tape having been subjected to plasma treatment or sputtering.