US 11,989,873 B2
Stochastic contour prediction system, method of providing the stochastic contour prediction system, and method of providing EUV mask using the stochastic contour prediction system
Wooyong Cho, Gyeonggi do (KR); and Gun Huh, Gyeonggi do (KR)
Assigned to Samsung Electronics Co., Ltd., (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Oct. 7, 2021, as Appl. No. 17/495,863.
Claims priority of application No. 10-2021-0031466 (KR), filed on Mar. 10, 2021.
Prior Publication US 2022/0292669 A1, Sep. 15, 2022
Int. Cl. G06T 7/00 (2017.01); G03F 7/00 (2006.01); G06F 18/2415 (2023.01); G06N 3/047 (2023.01); G06N 3/088 (2023.01)
CPC G06T 7/0006 (2013.01) [G03F 7/7065 (2013.01); G06F 18/2415 (2023.01); G06N 3/047 (2023.01); G06N 3/088 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of providing a stochastic prediction system, the method comprising:
extracting contours of patterns corresponding to a first design layout from a plurality of scanning electron microscope (SEM) images, respectively;
generating a first contour histogram image based on the contours; and
training a stochastic prediction model by using the first contour histogram image as an output, and by using the first design layout and a first resist image, a first aerial image, a first slope map, a first density map, and/or a first photo map corresponding to the first design layout as inputs,
wherein the stochastic prediction model comprises a cycle generative adversarial network (GAN).