US 11,989,817 B2
Apparatus and method for high quality ray-traced level of detail transitions
Holger Gruen, Peissenberg (DE); and Karthik Vaidyanathan, San Francisco, CA (US)
Assigned to Intel Corporation, Santa Clara, CA (US)
Filed by Intel Corporation, Santa Clara, CA (US)
Filed on Jun. 16, 2021, as Appl. No. 17/349,602.
Claims priority of provisional application 63/050,796, filed on Jul. 11, 2020.
Prior Publication US 2022/0012934 A1, Jan. 13, 2022
Int. Cl. G06T 15/06 (2011.01); G06T 15/00 (2011.01)
CPC G06T 15/06 (2013.01) [G06T 15/005 (2013.01); G06T 2210/36 (2013.01)] 24 Claims
OG exemplary drawing
 
1. A method comprising:
setting an instance comparison mask associated with an instance to a first level of detail (LOD), the instance comparison mask comprising an N-bit value and one or more bits to indicate a type of comparison operation;
comparing a value from a ray mask with the N-bit value in accordance with the type of comparison operation to generate a comparison result; and
determining whether to use the first LOD or a second LOD to render one or more pixels in accordance with the comparison result.