US 11,988,971 B2
Lithographic apparatus, substrate table, and method
Matthew Lipson, Stamford, CT (US); Satish Achanta, Leuven (BE); Benjamin David Dawson, Trumbull, CT (US); Matthew Anthony Sorna, Washington, DC (US); Iliya Sigal, Stamford, CT (US); and Tammo Uitterdijk, Wilton, CT (US)
Assigned to ASML HOLDING N.V., Veldhoven (NL); and ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/612,679
Filed by ASML HOLDING N.V., Veldhoven (NL); and ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed May 5, 2020, PCT No. PCT/EP2020/062463
§ 371(c)(1), (2) Date Nov. 19, 2021,
PCT Pub. No. WO2020/239373, PCT Pub. Date Dec. 3, 2020.
Claims priority of provisional application 62/852,578, filed on May 24, 2019.
Prior Publication US 2022/0082953 A1, Mar. 17, 2022
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70716 (2013.01) 20 Claims
OG exemplary drawing
 
1. A substrate table for supporting a substrate, the substrate table comprising:
a surface; and
coarse burls disposed on and spaced across the surface, wherein each of the coarse burls comprises:
a burl-top surface; and
deterministic fine burls disposed on the burl-top surface and configured to contact the substrate when the substrate table supports the substrate, wherein the burl-top surface comprises a roughened area disposed among the fine burls.