US 11,988,963 B2
Low temperature cure photoimageable dielectric compositions and methods of their use
Daniel J Nawrocki, Chicopee, MA (US); Yasumasa Akatsuka, Westborough, MA (US); and Katie Han, Westborough, MA (US)
Filed by Daniel J Nawrocki, Chicopee, MA (US); Yasumasa Akatsuka, Westborough, MA (US); and Katie Han, Westborough, MA (US)
Filed on Nov. 9, 2020, as Appl. No. 17/092,867.
Prior Publication US 2022/0146936 A1, May 12, 2022
Int. Cl. G03F 7/004 (2006.01); C08G 81/02 (2006.01); G03F 7/038 (2006.01); G03F 7/075 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01)
CPC G03F 7/0388 (2013.01) [C08G 81/02 (2013.01); C08G 81/025 (2013.01); G03F 7/004 (2013.01); G03F 7/0045 (2013.01); G03F 7/0751 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/32 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A photoimageable composition, comprising:
At least one first polyphenylene oxide-co-polybutadiene polymer having a general formula (1):

OG Complex Work Unit Chemistry
wherein PPE represents a polyphenylene oxide monomer, oligomer, polymer or a combination thereof, wherein A represents an ester section wherein the carboxy group of the ester section is connected to a vinyl group or a urethane group, wherein the nitrogen of the urethane group is connected to the vinyl group, wherein B represents an ester linking group or a urethane linking group, wherein n is 25-100, and wherein the polyphenylene oxide monomer, oligomer, polymer, or a combination thereof may be substituted with hydrogen, branched or unbranched, substituted or unsubstituted alkyl groups of 1-16 carbon atoms with or without one or more heteroatoms substituted into the chain, substituted or unsubstituted aromatic groups, substituted or unsubstituted heteroaromatic groups, substituted or unsubstituted fused aromatic or fused heteroaromatic groups, substituted or unsubstituted cycloalkyl groups with or without one or more heteroatoms substituted into the cyclic ring, halogens, chalcogens, pnictogens, oxides of sulfur, oxides of phosphorous, silicon, and oxides of silicon.
 
14. A method for forming dielectric layers and patterns comprising the steps of:
i. providing a substrate,
ii. applying the photoimageable composition of claim 2 to a desired wet thickness,
iii. heating the substrate to remove a substantial portion of the solvent to obtain a desired thickness,
iv. imagewise exposing the coated photoimageable composition to actinic radiation,
v. soft baking the exposed coated substrate
vi. removing the unexposed areas of the photoimageable composition using an organic solvent developer, and
vii. baking the remaining photoexposed, photoimageable composition.