	US 11,988,959 B2
	Organometallic solution based high resolution patterning compositions and corresponding methods
Stephen T. Meyers, Corvallis, OR (US); Jeremy T. Anderson, Corvallis, OR (US); Joseph B. Edson, Corvallis, OR (US); Kai Jiang, Corvallis, OR (US); Douglas A. Keszler, Corvallis, OR (US); Michael K Kocsis, Albany, OR (US); Alan J. Telecky, Albany, OR (US); and Brian J. Cardineau, Corvallis, OR (US)
Assigned to Inpria Corporation, Corvallis, OR (US)
Filed by Inpria Corporation, Corvallis, OR (US)
Filed on Mar. 28, 2022, as Appl. No. 17/705,795.
Application 17/705,795 is a continuation of application No. 17/085,024, filed on Oct. 30, 2020.
Application 17/085,024 is a continuation of application No. 16/674,714, filed on Nov. 5, 2019, granted, now 11,392,029.
Application 16/674,714 is a continuation of application No. 14/920,107, filed on Oct. 22, 2015, granted, now 10,642,153, issued on May 5, 2020.
Claims priority of provisional application 62/067,552, filed on Oct. 23, 2014.
Claims priority of provisional application 62/119,972, filed on Feb. 24, 2015.
Prior Publication US 2022/0291582 A1, Sep. 15, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01)

CPC G03F 7/0042 (2013.01) [G03F 7/0043 (2013.01); G03F 7/2004 (2013.01); G03F 7/32 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01)]

25 Claims

1. A method for forming a radiation sensitive, patternable organotin oxide-containing film, the method comprising:

depositing a tin precursor composition to form a coating on a substrate surface, the tin precursor composition having a radiation sensitive Sn—C bond and a hydrolysable ligand; and

baking the substrate with the coating,

wherein the hydrolysable ligands are replaced by hydroxo ligands during depositing and baking to form the radiation sensitive, patternable organotin oxide-containing film, the film comprising a composition described by the formula (R)_zSnO_2-z/2-x/2(OH)_x, (0<(x+z)<4), where R is an alkyl, cycloalkyl or substituted alkyl moiety having from 1 to 31 carbon atoms.