CPC G03F 7/0042 (2013.01) [G03F 7/0043 (2013.01); G03F 7/2004 (2013.01); G03F 7/32 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01)] | 25 Claims |
1. A method for forming a radiation sensitive, patternable organotin oxide-containing film, the method comprising:
depositing a tin precursor composition to form a coating on a substrate surface, the tin precursor composition having a radiation sensitive Sn—C bond and a hydrolysable ligand; and
baking the substrate with the coating,
wherein the hydrolysable ligands are replaced by hydroxo ligands during depositing and baking to form the radiation sensitive, patternable organotin oxide-containing film, the film comprising a composition described by the formula (R)zSnO2-z/2-x/2(OH)x, (0<(x+z)<4), where R is an alkyl, cycloalkyl or substituted alkyl moiety having from 1 to 31 carbon atoms.
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