CPC G03F 7/0002 (2013.01) [C08F 220/56 (2013.01); C08G 77/04 (2013.01); C12Q 1/6869 (2013.01); G03F 7/0757 (2013.01); G03F 7/165 (2013.01); G03F 7/0046 (2013.01)] | 15 Claims |
1. A method, comprising:
patterning a resin to form a patterned resin including depressions separated by interstitial regions;
introducing a solution including a block copolymer on the patterned resin, each block of the block copolymer having a block-specific functional group that is different from the block-specific functional group of each other block of the block copolymer;
exposing the solution to solvent vapor annealing, whereby the block copolymer phase separates and self-assembles in the depressions; and
grafting a primer to the block-specific functional group of at least one of the blocks.
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