US 11,988,956 B2
Measurement method, imprint apparatus, and article manufacturing method
Shinichi Shudo, Saitama (JP); and Masataka Yasukawa, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Mar. 22, 2021, as Appl. No. 17/208,402.
Claims priority of application No. 2020-071199 (JP), filed on Apr. 10, 2020.
Prior Publication US 2021/0318610 A1, Oct. 14, 2021
Int. Cl. G03F 7/00 (2006.01); G01B 13/16 (2006.01)
CPC G03F 7/0002 (2013.01) [G01B 13/16 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A measurement method comprising:
while driving a measurement target region of a surface of a substrate in a first direction with respect to a measurement unit by a drive unit configured to drive, in a floating state, a holding unit including a holding surface configured to hold the substrate, obtaining first measurement information indicating a height of the measurement target region in each of a plurality of first measurement lines parallel to the first direction and different from each other by measuring each measurement line by the measurement unit,
while driving the measurement target region with respect to the measurement unit in a second direction crossing all of the plurality of first measurement lines by the drive unit, obtaining second measurement information indicating a height of the measurement target region in one second measurement line parallel to the second direction by measuring the second measurement line by the measurement unit,
generating first distribution information indicating a height distribution of the measurement target region based on the first measurement information and the second measurement information; and
generating second distribution information indicating a height distribution of the holding surface based on the first measurement information and the second measurement information obtained in the obtaining the first measurement information and in the obtaining the second measurement information, respectively, in a state in which the substrate is rotated around a vertical axis of the substrate so that an angle of the substrate on the holding surface is set to a first angle, and the first measurement information and the second measurement information obtained in the obtaining the first measurement information and in the obtaining the second measurement information, respectively, in a state in which the substrate is rotated around the vertical axis of the substrate so that the angle of the substrate on the holding surface is set to a second angle different from the first angle.