US 11,988,954 B2
Optical proximity effect correction method and apparatus, device and medium
Jin Xu, Hefei (CN)
Assigned to CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei (CN)
Appl. No. 17/310,858
Filed by CHANGXIN MEMORY TECHNOLOGIES, INC., Anhui (CN)
PCT Filed Mar. 8, 2021, PCT No. PCT/CN2021/079585
§ 371(c)(1), (2) Date Aug. 26, 2021,
PCT Pub. No. WO2021/180042, PCT Pub. Date Sep. 16, 2021.
Claims priority of application No. 202010175353.0 (CN), filed on Mar. 13, 2020.
Prior Publication US 2022/0317556 A1, Oct. 6, 2022
Int. Cl. G03F 1/36 (2012.01)
CPC G03F 1/36 (2013.01) 17 Claims
OG exemplary drawing
 
1. An optical proximity effect correction method, comprising:
fabricating a test pattern mask according to design rules of a target pattern;
obtaining data required by an optical proximity effect correction model, and establishing the optical proximity effect correction model;
obtaining line end shortening data of the test pattern, and establishing a line end shortening rule table;
determining an initial correction value according to the line end shortening rule table; and
correcting the target pattern according to the initial correction value and the optical proximity effect correction model;
wherein, after the obtaining data required by an optical proximity effect correction model and establishing the optical proximity effect correction model, the method further comprises:
verifying the optical proximity effect correction model, and comparing line end shortening data obtained by the optical proximity effect correction model with the line end shortening data of the test pattern; and
determining the optical proximity effect correction model meets application conditions if an absolute value of a difference between the line end shortening data obtained by the optical proximity effect correction model and the line end shortening data of the test pattern is less than or equal to a preset threshold.