CPC G02F 1/093 (2013.01) [G02F 1/091 (2013.01); G02B 1/12 (2013.01)] | 14 Claims |
1. A system for EUV radiation generation, the system comprising:
a driver laser system comprising:
a beam source configured to generate at least one laser beam propagating in a first direction;
an amplifier system comprising at least one optical amplifier configured to amplify the laser beam propagating in the first direction; and
at least one optical isolator configured to suppress laser radiation propagating in a second direction opposite to the first direction,
wherein the optical isolator comprises:
at least one Faraday rotator; and
a first polarizer and a second polarizer, between which the Faraday rotator is arranged,
wherein the Faraday rotator comprises:
a disk-shaped magneto-optical solid-state medium;
a magnet generator configured to generate a magnetic field in the magneto-optical solid-state medium;
a heat sink with a support surface for the magneto-optical solid-state medium;
a reflector mounted between the heat sink and the magneto-optical solid-state medium and configured to reflect a laser beam entering the magneto-optical solid-state medium in a first impingement region on a first side of the magneto-optical solid-state medium, the first side facing away from the support surface; and
a deflector configured to deflect the laser beam emerging from the magneto-optical solid-state medium back to the first side of the magneto-optical solid-state medium,
wherein the deflector is configured to deflect the laser beam back to a second impingement region that at least partly overlaps with the first impingement region on the first side of the magneto-optical solid-state medium.
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