US 11,988,575 B2
Reticle defect inspection method and system
Lihua Hou, Hefei (CN); and Wen-Hao Hsu, Hefei (CN)
Assigned to Changxin Memory Technologies, Inc., Hefei (CN)
Filed by CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei (CN)
Filed on Aug. 30, 2021, as Appl. No. 17/460,404.
Application 17/460,404 is a continuation of application No. PCT/CN2021/100235, filed on Jun. 16, 2021.
Claims priority of application No. 202010717492.1 (CN), filed on Jul. 23, 2020.
Prior Publication US 2022/0026307 A1, Jan. 27, 2022
Int. Cl. G01M 11/02 (2006.01); G03F 7/00 (2006.01)
CPC G01M 11/0278 (2013.01) [G03F 7/70591 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A reticle defect inspection method, comprising:
providing a reticle;
providing a reticle defect inspection system, and in a case where the reticle is placed on a station or leaves the station, continuously performing defect inspection on the reticle to obtain defect information of each defect;
obtaining a dynamic threshold of each defect from the defect information of each defect;
judging whether the dynamic threshold of each defect belongs to a threshold unacceptable by the reticle defect inspection system, and when the dynamic threshold of one or more defects belongs to a threshold unacceptable by the reticle defect inspection system, performing warning processing;
before inspection, setting a static threshold of the reticle defect inspection system, and in a case where the defect information of a defect reaches the static threshold, obtaining historical defect information of the defect;
calculating a measurement error range of the defect according to the historical defect information of the defect; and
calculating the threshold unacceptable by a dynamic threshold inspection system of the defect according to the static threshold and the measurement error range.