US 11,988,574 B2
Illumination system for AR metrology tool
Yangyang Sun, San Jose, CA (US); Jinxin Fu, Fremont, CA (US); Kazuya Daito, Milpitas, CA (US); and Ludovic Godet, Sunnyvale, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 23, 2021, as Appl. No. 17/456,240.
Claims priority of provisional application 63/184,398, filed on May 5, 2021.
Claims priority of provisional application 63/117,576, filed on Nov. 24, 2020.
Prior Publication US 2022/0163423 A1, May 26, 2022
Int. Cl. G01M 11/02 (2006.01); G02B 19/00 (2006.01); G02B 27/30 (2006.01); G06T 7/00 (2017.01); H04N 23/56 (2023.01)
CPC G01M 11/0264 (2013.01) [G02B 19/0047 (2013.01); G02B 27/30 (2013.01); G06T 7/0002 (2013.01); H04N 23/56 (2023.01); G06T 2207/10152 (2013.01); G06T 2207/30168 (2013.01); G06T 2207/30204 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A method, comprising:
projecting a pattern, the pattern projected with a light from a light engine, the light engine disposed in a measurement system, the measurement system having:
a stage operable to retain an optical device or an optical device substrate having at least one optical device disposed thereon, the light engine disposed above the stage;
projecting a light at a range of wavelengths from a plurality of light sources of the light engine toward the at least one optical device;
collimating the light from a plurality of light sources through a first lens;
positioning a reticle tray disposed below the plurality of light sources, the reticle tray having a plurality of reticles disposed thereon, each reticle of the plurality of reticles having a different pattern to be projected when the light is directed to each reticle of the plurality of reticles, each reticle pattern corresponding to a different metrology metric, the reticle tray movable such that each of the plurality of reticles is positionable below the first lens; and
directing the pattern projected from reticle tray to a second lens disposed below the reticle tray;
projecting the pattern from second lens to an input coupling grating of the optical device; detecting one or more images of the pattern, the image detected when the pattern undergoing total internal reflection through the optical device is outcoupled to a reflection detector; and
processing the image to extract the metrology metric.