CPC F04B 49/00 (2013.01) [F04B 43/12 (2013.01); F04B 51/00 (2013.01); F04B 43/02 (2013.01); F04B 53/16 (2013.01)] | 20 Claims |
1. A method for controlling a chemical feed rate to a destination stock, the method comprising:
using a metering pump system to supply an aqueous chemical at a desired feed rate through a system discharge, the metering pump system comprising:
a housing having a floor extending horizontally forward from a vertical panel;
a first mount supporting a first metering pump above the floor;
a second mount supporting a second metering pump above the floor;
a system inlet and the system discharge located aft of the first mount and the second mount;
a first inlet conduit connected to the first metering pump forward of the first mount, extending through the floor, and connected to the system discharge aft of the first mount;
a second inlet conduit connected to the second metering pump forward of the second mount, extending through the floor, and connected to the system discharge aft of the second mount;
a first outlet conduit connected to the first metering pump forward of the first mount, extending through the floor, and connected to the system discharge aft of the first mount;
a second outlet conduit connected to the second metering pump forward of the second mount, extending through the floor, and connected to the system discharge aft of the second mount; and
a flowrate sensor in one of the system inlet or the system discharge;
operating the first metering pump at a calibrated feed rate corresponding to the desired feed rate;
obtaining with the flowrate sensor an actual feed rate of the metering pump system while operating at the calibrated feed rate;
determining a deviation exists between the actual feed rate and the desired feed rate; and
changing, in response to the deviation, a pump speed of one or both of the first metering pump and the second metering pump to substantially achieve the desired feed rate.
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