US 11,987,895 B2
Modification method of anode for hydrogen production via electrolysis, anode for hydrogen production via electrolysis and use
Zhiyi Lu, Ningbo (CN); Zhongfeng Wang, Ningbo (CN); and Wenwen Xu, Ningbo (CN)
Assigned to NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING, CHINESE ACADEMY OF SCIENCES, Ningbo (CN)
Appl. No. 18/272,111
Filed by NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING, CHINESE ACADEMY OF SCIENCES, Ningbo (CN)
PCT Filed Aug. 17, 2022, PCT No. PCT/CN2022/113046
§ 371(c)(1), (2) Date Jul. 13, 2023,
PCT Pub. No. WO2023/226207, PCT Pub. Date Nov. 30, 2023.
Claims priority of application No. 202210578543.6 (CN), filed on May 25, 2022.
Prior Publication US 2024/0084465 A1, Mar. 14, 2024
Int. Cl. C25B 11/081 (2021.01); C25B 1/04 (2021.01); C25B 11/031 (2021.01)
CPC C25B 11/081 (2021.01) [C25B 1/04 (2013.01); C25B 11/031 (2021.01)] 4 Claims
 
1. A modification method of an anode for hydrogen production via electrolysis, comprising:
providing an anode substrate which can be used for hydrogen production via catalytic electrolysis and comprises a combination of any one or more than two of hydroxides, oxides, phosphides, and sulfides;
depositing a plurality of silver nano particles on the active surface of an anode substrate by using any one of an electroplating method, an electroless plating method, and a vapor plating method to form a silver nano layer, wherein gaps are present among the silver nano particles, and a part of the active surface is exposed from the gaps, and the particle size of the silver nano particle is 10-30 nm, the size of each gap is 100-300 nm, and the surface density of the silver nano particle in the silver nano layer is 200-500/μm2;
wherein, an electroplating solution used in the electroplating method comprises a silver salt, a complexing agent and an alkaline substance; the silver salt comprises silver nitrate; the concentration of the silver salt in the electroplating solution is 0.01-0.06 mol/L, the complexing agent comprises a combination of any one or two of sodium pyrophosphate or potassium pyrophosphate, the concentration of the complexing agent in the electroplating solution is 0.05-0.20 mol/L, the alkaline substance comprises sodium hydroxide or potassium hydroxide, the concentration of the alkaline substance in the electroplating solution is 0.2-1.0 mol/L; the current density used in the electroplating method is 3-10 mA/cm2; the electroplating method is a constant current mode, the electroplating time is 3-15 min, and the electroplating temperature is 20-30° C.;
the electroless plating temperature is 20-25° C., the electroless plating time is 5-10 minutes, the electroless plating solution used in the electroless plating method comprises a silver salt, a reducing agent and a stabilizer, the silver salt in the electroless plating solution comprises a combination of any one or two of silver sulfate and silver nitrate, the reducing agent comprises a combination of any one or two of glucose and sodium borohydride, and the stabilizer comprises a combination of any one or more than two of tartaric acid, ammonia and the sodium hydroxide, the concentration of the silver salt in the electroless planting solution is 0.01-0.1 mol/L, the concentration of the reducing agent is 0.1-0.5 mol/L, and the concentration of the stabilizer is 0.2-0.6 mol/L; and
the vapor plating method is done using magnetron sputtering, the power density of the magnetron sputtering is 150-250 W/cm2, and the time of the magnetron sputtering is 10-50 s.