US 11,987,885 B2
Gas supply apparatus, gas supply method, and substrate processing apparatus
Yuji Obata, Nirasaki (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Mar. 23, 2022, as Appl. No. 17/656,009.
Claims priority of application No. 2021-062746 (JP), filed on Apr. 1, 2021.
Prior Publication US 2022/0316060 A1, Oct. 6, 2022
Int. Cl. C23C 16/52 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01)
CPC C23C 16/52 (2013.01) [C23C 16/4412 (2013.01); C23C 16/45544 (2013.01); C23C 16/45561 (2013.01); C23C 16/45563 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A gas supply apparatus that supplies a gas to a processing space in which a gas processing is performed on a substrate, the gas supply apparatus comprising:
a gas supply source configured to supply a gas;
a gas supply path configured to supply the gas from the gas supply source to the processing space;
a storage tank configured to temporarily store the gas and provided in a portion of the gas supply path;
an opening/closing valve configured to supply/stop the gas and provided in the gas supply path downstream of the storage tank;
a detector configured to detect a detectable index correlated with a Cv value of the opening/closing valve;
an opening degree adjuster configured to adjust an opening degree of the opening/closing valve when the opening/closing valve is opened; and
a controller configured to: store a relationship between the Cv value of the opening/closing valve and the index; and control the opening degree of the opening/closing valve by the opening degree adjuster such that when the index deviates from an appropriate range corresponding to an appropriate Cv value, the index falls within the appropriate range,
wherein the index is detected at a portion downstream of the opening/closing valve.