US 11,987,884 B2
Glass and wafer inspection system and a method of use thereof
Youngjin Choi, San Jose, CA (US)
Assigned to JNK TECH, San Jose, CA (US)
Filed by JNK TECH, San Jose, CA (US)
Filed on Jun. 11, 2021, as Appl. No. 17/345,795.
Claims priority of provisional application 63/175,282, filed on Apr. 15, 2021.
Prior Publication US 2022/0230927 A1, Jul. 21, 2022
Int. Cl. C23C 16/52 (2006.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01); G01N 21/958 (2006.01); G06T 1/00 (2006.01); G06T 7/00 (2017.01); G06T 7/13 (2017.01); G06T 7/174 (2017.01); H01L 21/66 (2006.01); H01L 21/68 (2006.01)
CPC C23C 16/52 (2013.01) [G01N 21/8851 (2013.01); G01N 21/9501 (2013.01); G01N 21/958 (2013.01); G06T 1/0014 (2013.01); G06T 7/0004 (2013.01); G06T 7/13 (2017.01); G06T 7/174 (2017.01); H01L 21/681 (2013.01); H01L 22/12 (2013.01); G06T 2207/30148 (2013.01)] 4 Claims
OG exemplary drawing
 
1. A method for inspecting a substrate coating process, the method comprising the steps of:
providing a plurality of camera modules mounted to a load lock unit of a process chamber for coating thin film on a substrate;
receiving, by a robot, the substrate into a load lock unit through a first door;
upon receiving the substrate through the first door, capturing a first set of images by the plurality of camera of the substrate in the load lock unit;
realigning the substate by a robot in the load lock unit;
upon realigning, capturing a second set of images of the substrate by the plurality of cameras; and
analyzing, by a control unit, the second set of images in comparison with the first set of images to obtain a first set of parameters, the first set of parameters related to the accuracy of the robots in handling the substrate and any defects in the substrate due to handling.