US 11,987,498 B2
Gas production system and gas production method
Kyohei Aketagawa, Tokyo (JP); Isamu Hirashiki, Tokyo (JP); Tomohiro Nozaki, Tokyo (JP); and Kenta Sakata, Tokyo (JP)
Assigned to MITSUBISHI ELECTRIC CORPORATION, Tokyo (JP); and TOKYO INSTITUTE OF TECHNOLOGY, Tokyo (JP)
Appl. No. 17/432,532
Filed by Mitsubishi Electric Corporation, Tokyo (JP); and Tokyo Institute of Technology, Tokyo (JP)
PCT Filed Apr. 23, 2019, PCT No. PCT/JP2019/017116
§ 371(c)(1), (2) Date Aug. 20, 2021,
PCT Pub. No. WO2020/217289, PCT Pub. Date Oct. 29, 2020.
Prior Publication US 2022/0144631 A1, May 12, 2022
Int. Cl. C01B 3/26 (2006.01); C01B 3/34 (2006.01)
CPC C01B 3/26 (2013.01) [C01B 3/342 (2013.01); C01B 2203/0861 (2013.01); C01B 2203/16 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A gas production system which applies plasma to a catalyst and reforms a selected treatment target gas from among a plurality of treatment target gases to produce a product gas, the gas production system comprising:
voltage generation circuitry for generating voltage;
plasma generation circuitry for generating the plasma to be applied to the catalyst, using the voltage generated by the voltage generation circuitry;
frequency setting circuitry for changing and setting a frequency of the voltage used to generate the plasma, based on the selected treatment target gas, to vibrationally excite molecules of gas reactive material constituting the selected treatment target gas to produce the product gas;
a depressurizer to reduce a pressure in a reactor; and
a heat source to heat the catalyst, the heat source being different from the plasma generation circuitry and the plasma, wherein
the selected treatment target gas is a hydrocarbon-based gas and an oxidant gas, and the product gas is a hydrogen containing gas,
the frequency setting circuitry is configured to change and set the frequency of the voltage that is generated by an external power supply, based on the selected treatment target gas, in a range not less than 10 kHz and not greater than 1 MHz, and
the depressurizer sets the pressure in the reactor in accordance with the frequency of the voltage that is generated by the external power supply based on the treatment target gas.