US 11,986,967 B2
Apparatus for treating substrate and method for detecting state of substrate
Tae Kyung Kong, Cheonan-si (KR); and Jin Sung Sun, Cheonan-si (KR)
Assigned to Semes Co., Ltd., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Feb. 24, 2022, as Appl. No. 17/679,279.
Claims priority of application No. 10-2021-0068065 (KR), filed on May 27, 2021.
Prior Publication US 2022/0379485 A1, Dec. 1, 2022
Int. Cl. B25J 5/02 (2006.01); B25J 9/16 (2006.01); B25J 11/00 (2006.01)
CPC B25J 9/1697 (2013.01) [B25J 5/02 (2013.01); B25J 9/1664 (2013.01); B25J 9/1674 (2013.01); B25J 11/0095 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A substrate treating apparatus comprising:
a plurality of treating chambers performing a respective treatment on a substrate therein;
a transfer chamber having a robot transferring the substrate between the plurality of treating chambers;
a detection unit mounted on the robot and configured to detect a substrate state; and
a controller configured to control the detection unit,
wherein the detection unit comprises:
an imaging member configured to image the substrate; and
a driving member configured to move the imaging member, and
wherein the controller controls the detection unit to image and store an image of the substrate at an optimal position and determines whether an image of the substrate is a normal state based on the image obtained in the optimal position, the optimal position determined based on a process variable of the treating chamber.