US 11,986,920 B2
Polishing method, polishing agent and cleaning agent for polishing
Mikiya Sakashita, Nagoya Aichi (JP); Yumiko Kataoka, Yokkaichi Mie (JP); and Yukiteru Matsui, Nagoya Aichi (JP)
Assigned to Kioxia Corporation, Tokyo (JP)
Filed by KIOXIA CORPORATION, Tokyo (JP)
Filed on Sep. 2, 2020, as Appl. No. 17/010,729.
Claims priority of application No. 2020-052315 (JP), filed on Mar. 24, 2020.
Prior Publication US 2021/0299814 A1, Sep. 30, 2021
Int. Cl. B24B 37/015 (2012.01); B24B 37/013 (2012.01); C08L 1/08 (2006.01); C09G 1/02 (2006.01)
CPC B24B 37/015 (2013.01) [B24B 37/013 (2013.01); C09G 1/02 (2013.01); C08L 1/08 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A polishing method, comprising:
supplying a polishing agent at a first temperature to be between a to-be-polished surface and a polishing cloth; and
polishing the to-be-polished surface with the polishing agent while rotating at least one of the to-be-polished surface and the polishing cloth, wherein
the polishing agent comprises abrasive grains and an organic polymer which makes a reversible phase transition between a gel state and a sol state depending on a temperature,
the organic polymer is at in the sol state at the first temperature,
the polishing of the to-be-polished surface includes a first polishing stage in which the temperature of the polishing cloth is higher than the first temperature,
the viscosity of the organic polymer in the first polishing stage is higher than the viscosity of the organic polymer at time of the supplying,
the polishing of the to-be-polished surface further includes, after the first polishing stage, a second polishing stage in which the temperature of the polishing cloth is lower than that in the first polishing stage, and
the viscosity of the organic polymer in the second polishing stage is lower than the viscosity of the organic polymer in the first polishing stage.
 
9. A polishing method, comprising:
supplying a polishing agent from a supply section to a polishing cloth; and
polishing a surface of a substrate by rotating at least one of the substrate and the polishing cloth, wherein
the polishing agent comprises abrasive grains and an organic polymer which makes a reversible phase transition between a gel state and a sol state depending on a temperature,
the polishing agent is supplied from the supply section at a first temperature at which the organic polymer is in a sol state, and
the polishing of the to-be-polished surface includes a first polishing stage in which the polishing cloth is a second temperature that is higher than the first temperature and the organic polymer is a gel state, followed by a second polishing stage in which the temperature of the polishing cloth is less than the second temperature and the organic polymer is in a sol state.