US 11,659,778 B2
Composite electrode material chemistry
Pengyuan Zheng, Boise, ID (US); Enrico Varesi, Milan (IT); Lorenzo Fratin, Buccinasco (IT); Dale Collins, Boise, ID (US); and Yongjun J. Hu, Boise, ID (US)
Assigned to Micron Technology, Inc., Boise, ID (US)
Filed by Micron Technology, Inc., Boise, ID (US)
Filed on Feb. 11, 2020, as Appl. No. 16/788,204.
Prior Publication US 2021/0249598 A1, Aug. 12, 2021
Int. Cl. H01L 45/00 (2006.01); C23C 14/06 (2006.01); C23C 14/34 (2006.01); H01L 27/24 (2006.01)
CPC H01L 45/1253 (2013.01) [C23C 14/0635 (2013.01); C23C 14/34 (2013.01); H01L 27/2481 (2013.01); H01L 45/06 (2013.01); H01L 45/1233 (2013.01); H01L 45/141 (2013.01); H01L 45/16 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A method, comprising:
sputtering a composition of a tantalum-carbon compound with a first sputtering target; and
forming an electrode comprising a composition of a first material doped with a second material that comprises the composition of the tantalum-carbon compound, wherein the composition of the first material doped with the second material at a first end of the electrode is different than the composition of the first material doped with the second material at a second end of the electrode, the second end of the electrode coupled with a storage element comprising chalcogenide, the second end of the electrode being chemically inert with the storage element, the second end of the electrode associated with a thermal stable electrical resistivity for signals communicated between an access line and the storage element via the electrode.