US 11,658,006 B2
Plasma sources and plasma processing apparatus thereof
Vladimir Nagorny, Tracy, CA (US); Wei Liu, San Jose, CA (US); and Rene George, San Carlos, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jan. 14, 2021, as Appl. No. 17/149,254.
Prior Publication US 2022/0223374 A1, Jul. 14, 2022
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/3211 (2013.01) [H01J 37/3244 (2013.01); H01J 2237/332 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A plasma source, comprising:
a first sidewall forming a cylinder;
a gas injection insert disposed within the cylinder and located at an upper end of the first sidewall, the gas injection insert having a second sidewall with a cylindrical shape, the gas injection insert and the first sidewall defining a plasma source interior volume, the gas injection insert comprising:
a peripheral gas injection port coupled to the first sidewall, the peripheral gas injection port disposed radially outward of the center gas injection port and the second sidewall and disposed radially inward of the first sidewall, the peripheral gas injection port in fluid communication with the plasma source interior volume and having an outlet located at a first vertical position;
a center gas injection port disposed around the second sidewall and having an outlet located at a second vertical position different than the first vertical position, the center gas injection port in fluid communication with the plasma source interior volume; and
an induction coil disposed around the first sidewall, wherein the outlet located at the second vertical position is substantially aligned along a vertical center of the induction coil and the outlet located at the first vertical position is unaligned along the vertical center of the induction coil.