US 11,656,555 B2
Lithographic apparatus and illumination uniformity correction system
Janardan Nath, Norwalk, CT (US); Kalyan Kumar Mankala, Bethel, CT (US); Todd R. Downey, Monroe, CT (US); Joseph Harry Lyons, Wilton, CT (US); Ozer Unluhisarcikli, Norwalk, CT (US); Alexander Harris Ledbetter, Fairfield, CT (US); Nicholas Stephen Apone, Fairfield, CT (US); and Tian Gang, Best (NL)
Assigned to ASML HOLDING N.V., Veldhoven (NL); and ASML NETHERLANDS B V, Veldhoven (NL)
Appl. No. 17/605,601
Filed by ASML HOLDING N.V., Veldhoven (NL); and ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Apr. 14, 2020, PCT No. PCT/EP2020/060376
§ 371(c)(1), (2) Date Oct. 22, 2021,
PCT Pub. No. WO2020/216643, PCT Pub. Date Oct. 29, 2020.
Claims priority of provisional application 62/839,088, filed on Apr. 26, 2019.
Prior Publication US 2022/0214622 A1, Jul. 7, 2022
Int. Cl. G03F 7/20 (2006.01)
CPC G03F 7/70191 (2013.01) [G03F 7/70083 (2013.01); G03F 7/70133 (2013.01)] 20 Claims
OG exemplary drawing
1. An illumination adjustment apparatus to adjust a cross slot illumination of a beam in a lithographic apparatus, the illumination adjustment apparatus comprising:
a plurality of fingers configured to adjust the cross slot illumination to conform to a selected intensity profile,
wherein each finger has a distal edge comprising at least two segments, and
wherein the at least two segments form an indentation of the distal edge such that there is a portion of the indentation nearer a middle of the cross slot illumination on either side of the indentation, and
wherein at least part of the distal edge aligns with a part of the shape of the cross slot illumination at the respective finger.