US 11,656,544 B2
Robust, high transmission pellicle for extreme ultraviolet lithography systems
Yun-Yue Lin, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu (TW)
Filed on Apr. 25, 2022, as Appl. No. 17/728,945.
Application 17/728,945 is a division of application No. 16/885,126, filed on May 27, 2020, granted, now 11,314,169.
Claims priority of provisional application 62/928,230, filed on Oct. 30, 2019.
Prior Publication US 2022/0252986 A1, Aug. 11, 2022
Int. Cl. G03F 1/64 (2012.01); G03F 7/20 (2006.01)
CPC G03F 1/64 (2013.01) [G03F 7/70983 (2013.01); G03F 7/2004 (2013.01)] 20 Claims
 
1. A pellicle, comprising:
a membrane, wherein the membrane comprises at least one selected from the group of a transparent carbon-based film and a transparent silicon based film, wherein the at least one selected from the group of the transparent carbon-based film and the transparent silicon based film is coated with a protective shell that dissipates heat from the membrane; and
a frame supporting the membrane, wherein the frame includes at least one aperture to allow for a flow of air through a portion of the pellicle.