US 11,656,236 B2
Mirror calibration of multiple flow-measurement devices
Aaron Serafin Avenido, Minneapolis, MN (US); Russell R. Graze, Dunlap, IL (US); Jason Paul Johnson, Saint Paul, MN (US); and Robert C. Anderson, Glenmont, NY (US)
Assigned to TSI Incorporated, Shoreview, MN (US)
Appl. No. 17/765,239
Filed by TSI Incorporated, Shoreview, MN (US)
PCT Filed Dec. 31, 2019, PCT No. PCT/US2019/069085
§ 371(c)(1), (2) Date Mar. 30, 2022,
PCT Pub. No. WO2021/066868, PCT Pub. Date Apr. 8, 2021.
Claims priority of provisional application 62/907,886, filed on Sep. 30, 2019.
Prior Publication US 2022/0283072 A1, Sep. 8, 2022
Int. Cl. G01N 35/00 (2006.01); G01N 1/38 (2006.01); G01N 1/20 (2006.01); G01N 1/22 (2006.01); G01N 15/10 (2006.01); G01N 15/14 (2006.01)
CPC G01N 35/00693 (2013.01) [G01N 1/2035 (2013.01); G01N 1/38 (2013.01); G01N 1/2252 (2013.01); G01N 15/1012 (2013.01); G01N 2001/2255 (2013.01); G01N 2015/1486 (2013.01); G01N 2015/1493 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A calibration and dilution system, comprising:
a primary diluter;
a secondary diluter, the primary diluter and the secondary diluter being pneumatically coupled to one another through a gas supply line;
a volatile-particle remover configured to be coupled on an inlet side to the primary diluter and on a first outlet side to the secondary diluter, the volatile-particle remover further including a secondary outlet pneumatically located between the inlet side and the outlet side;
a first mass-flow device to serve as a global reference and provide a supply of clean gas to the primary diluter;
a second mass-flow device configured to be coupled to provide a supply of clean gas to the secondary diluter;
a third mass-flow device configured to be coupled to one of the first mass-flow device and the second mass-flow device, the third mass-flow device further configured to be coupled to the secondary outlet side of the volatile-particle remover;
a plurality of valves coupled to at least the first mass-flow device, the second mass-flow device, the third mass-flow device, the primary diluter, the secondary diluter, and the volatile-particle remover, the calibration and dilution system being further configured such that each of the second mass-flow device and the third mass-flow device can be calibrated in-situ relative to at least one of the remaining mass-flow devices without having to remove any of the mass-flow devices from the calibration and dilution system.