US 11,656,219 B2
Apparatus and method for storing thin film device and method for measuring biological molecule
Kazuma Matsui, Tokyo (JP); Michiru Fujioka, Tokyo (JP); and Yusuke Goto, Tokyo (JP)
Assigned to Hitachi High-Technologies Corporation, Tokyo (JP)
Appl. No. 16/624,265
Filed by HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo (JP)
PCT Filed Jul. 7, 2017, PCT No. PCT/JP2017/024927
§ 371(c)(1), (2) Date Dec. 18, 2019,
PCT Pub. No. WO2019/008736, PCT Pub. Date Jan. 10, 2019.
Prior Publication US 2020/0116697 A1, Apr. 16, 2020
Int. Cl. G01N 33/487 (2006.01); C12Q 1/6869 (2018.01); B82Y 5/00 (2011.01)
CPC G01N 33/48721 (2013.01) [C12Q 1/6869 (2013.01); G01N 33/48785 (2013.01); B82Y 5/00 (2013.01); C12Q 2565/631 (2013.01)] 6 Claims
 
1. A method for storing a thin film device having an insulating thin film containing Si and having a maximum thickness of 100 nm, the method comprising:
a step of hydrophilizing the thin film device; and
a step of storing the hydrophilized thin film device in contact with a solution in a container having a tank that is sealed for prevention of volatilization and that satisfies any of conditions (1) to (3):
(1) a solution containing water in a volume ratio in a range from 0% to 30%;
(2) a solution cooled and maintained at a temperature higher than its solidification point and lower than 15° C.; and
(3) a solution that contains a salt with a concentration of 10 mol/L or more and a saturation concentration or less and is cooled and maintained to a temperature higher than its solidification point and lower than 25° C.