US 11,655,539 B2
Film deposition apparatus and film deposition method
Hitoshi Kato, Iwate (JP); and Tomoya Hasegawa, Iwate (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Jul. 24, 2019, as Appl. No. 16/520,955.
Claims priority of application No. JP2018-146227 (JP), filed on Aug. 2, 2018.
Prior Publication US 2020/0040456 A1, Feb. 6, 2020
Int. Cl. H01L 21/67 (2006.01); C23C 16/458 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01); C23C 16/40 (2006.01)
CPC C23C 16/46 (2013.01) [C23C 16/40 (2013.01); C23C 16/4557 (2013.01); C23C 16/4584 (2013.01); C23C 16/52 (2013.01); H01L 21/67248 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A film deposition apparatus comprising:
a process chamber including a ceiling plate;
a turntable disposed in the process chamber and configured to receive a substrate along a circumferential direction;
at least one ozone gas supply nozzle configured to supply ozone gas on the turntable;
a plate member disposed to cover the ozone gas supply nozzle; and
an ozone gas activator disposed on or directly above an upper surface of the plate member and configured to activate the ozone gas, wherein only the at least one ozone gas supply nozzle has a gas discharge hole, and the plate member and the ozone gas activator are formed separately from the ozone gas supply nozzle,
wherein the ozone gas activator is disposed between the plate member and the ceiling plate of the process chamber,
wherein the ozone gas activator and the at least one ozone gas supply nozzle extend in a radial direction of the turntable, and
wherein the ozone gas activator overlaps the at least one ozone gas supply nozzle in a direction perpendicular to the turntable,
wherein the at least one ozone gas supply nozzle includes only one nozzle, and the plate member includes an accommodating portion that accommodates the only one nozzle, and wherein the ozone gas activator is arranged at a downstream side in a rotation direction of the turntable relative to the only one nozzle.