US 11,654,458 B2
Substrate-cleaning apparatus having tiltable roll brush
Yonghee Lee, Seoul (KR); Byoungho Kwon, Hwaseong-si (KR); and Kuntack Lee, Suwon-si (KR)
Assigned to Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Oct. 27, 2020, as Appl. No. 17/81,855.
Claims priority of application No. 10-2020-0060842 (KR), filed on May 21, 2020.
Prior Publication US 2021/0362198 A1, Nov. 25, 2021
Int. Cl. B08B 1/00 (2006.01); B08B 13/00 (2006.01); B08B 1/04 (2006.01); A46B 13/00 (2006.01); A46B 13/02 (2006.01); B08B 3/04 (2006.01); B24B 7/22 (2006.01); B24B 37/04 (2012.01); B24B 37/00 (2012.01); B24B 7/00 (2006.01)
CPC B08B 1/002 (2013.01) [A46B 13/001 (2013.01); A46B 13/02 (2013.01); B08B 1/04 (2013.01); B08B 3/04 (2013.01); B08B 13/00 (2013.01); A46B 2200/30 (2013.01); B24B 7/00 (2013.01); B24B 7/22 (2013.01); B24B 37/00 (2013.01); B24B 37/04 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate-cleaning apparatus comprising:
a roll brush coupled to a tilting arm;
a support arm positioned on the tilting arm;
a first spring and a second spring coupling the tilting arm to the support arm;
a first air bag and a second air bag mounted between the tilting arm and the support arm; and
a controller configured to adjust a first internal pressure of the first air bag and a second internal pressure of the second air bag,
wherein the controller defines an inclination of the roll brush by adjusting a difference between the first internal pressure and the second internal pressure.