| CPC H05G 2/003 (2013.01) [G03F 7/70033 (2013.01); G21K 1/06 (2013.01); H05G 2/008 (2013.01)] | 13 Claims |
|
1. An extreme ultraviolet light generation apparatus, comprising:
a chamber including, at an internal space thereof, a plasma generation region in which plasma is generated from a droplet target irradiated with laser light;
a housing extending from the internal space to outside of the chamber, surrounding the plasma generation region except on a trajectory of the droplet target at the internal space and on an optical path of the laser light to the plasma generation region at the internal space, and including a first opening through which extreme ultraviolet light generated from the plasma passes;
a light concentrating mirror arranged in a first space outside the housing at the internal space and configured to reflect the extreme ultraviolet light having passed through the first opening in a direction different from an incident direction of the extreme ultraviolet light;
a gas supply port provided in the chamber and configured to supply a gas from outside of the chamber to the first space; and
a gas exhaust port provided at the housing outside the chamber and configured to exhaust the gas flowing from the first space to a second space inside of the housing through the first opening to the outside of the chamber,
an optical axis of the laser light when being radiated to the droplet target being along a direction in which the gas flows in the plasma generation region,
the extreme ultraviolet light generation apparatus further comprising a first pipe that surrounds the optical path of the laser light in the first space and extends to the outside of the chamber,
wherein the first pipe extends toward a second opening at the housing through which the laser light passes from the first space toward the plasma generation region, and supplies a gas from the outside of the chamber through the second opening to the plasma generation region, and
wherein a first flow velocity in the plasma generation region of the gas traveling from the first pipe to the plasma generation region is higher than a second flow velocity in the plasma generation region of the gas traveling from the first space through the first opening to the plasma generation region.
|