US 12,308,218 B2
Thermal shield for processing chamber
Youngki Chang, Santa Clara, CA (US); Muhannad Mustafa, Milpitas, CA (US); Kartik Shah, Saratoga, CA (US); Dhritiman Subha Kashyap, Bangalore (IN); and Dhivanraj Subramanian, Tamil Nadu (IN)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 2, 2022, as Appl. No. 17/685,046.
Prior Publication US 2023/0282454 A1, Sep. 7, 2023
Int. Cl. H01J 37/20 (2006.01); H01J 37/32 (2006.01)
CPC H01J 37/32724 (2013.01) [H01J 37/32715 (2013.01); H01J 37/32651 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A substrate processing chamber comprising:
a chamber body having a top wall, a bottom wall and a sidewall containing an interior volume and a process region;
a pump port positioned on a first side of the sidewall of the chamber body adjacent to the process region and configured to evacuate gases from the process region and a slit valve positioned on a second side of the sidewall of the chamber body and opposite the first side;
a substrate support within the interior volume, the substrate support comprising a support shaft with a support body on an end of the support shaft, the support body having a support surface and a back surface defining a thickness of the support body, a heater is within the thickness of the support body; and
a thermal shield comprising a disc-shaped body having a thickness, a central axis and a diameter with a first edge on a first side of the disc-shaped body positioned adjacent to the pump port and a second edge on a second side of the disc-shaped body positioned adjacent to the slit valve, the first edge and the second edge at opposite ends of a diameter of the disc-shaped body, a front surface and a back surface that define the thickness of the disc-shaped body, the thermal shield positioned along the support shaft at a distance from the support body so that there is a gap between the back surface of the support body and the front surface of the thermal shield, the front surface of the disc-shaped body comprising a first longitudinal region comprising the first edge and extending a distance from the first edge toward the central axis and a second longitudinal region comprising the second edge and extending a distance from the second edge toward the central axis along the diameter, the first longitudinal region having a first emissivity in a range of from 0 to 0.35 and the second longitudinal region having a second emissivity in a range of from 0.36 to 1 and the first longitudinal region and the second longitudinal region are configured to reduce side to side temperature variation of the support surface.