US 12,306,546 B2
Method for overlay control based on a semiconductor device pattern, and method and system for generating a photomask
Tian-Xing Huang, Tainan (TW)
Assigned to PROSEMI CO., LTD., Tainan (TW)
Filed by Prosemi Co., Ltd., Tainan (TW)
Filed on Feb. 8, 2022, as Appl. No. 17/667,067.
Claims priority of application No. 110105044 (TW), filed on Feb. 9, 2021.
Prior Publication US 2022/0252991 A1, Aug. 11, 2022
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70633 (2013.01) 15 Claims
 
1. A method for overlay control based on a semiconductor device pattern, the method being implemented using a system and comprising:
obtaining a selected area from the semiconductor device pattern, the semiconductor device pattern including a wiring pattern section with a first pattern image and a second pattern image that are images of two wiring patterns formed in different steps in a semiconductor fabrication process;
obtaining two overlay errors respectively for two different locations associated with the first pattern image and the second pattern image;
calculating a calibration dimension based on either the overlay errors or a pre-set value; and
generating a calibration image with one dimension thereof equaling the calibration dimension, and generating a calibrated area based on the selected area and the calibration image.